Mr. Yoshida and Dr. Yoshimoto @ SPIE Advanced Lithography 2016 (California, USA)
Mr. Yoshida (1st-year master course) and Dr. Yoshimoto will present their collaborative work on the directed self assembly with Toshiba at SPIE Advanced Lithography 2016 in San Jose, California (USA), Feb. 21st-25th, 2016.
Title: “Control of morphological defects at the boundary between the periodic and non-periodic patterns in directed self-assembly process”
Authors: A. Yoshida, K. Yoshimoto, M. Ohshima (Kyoto University) K. Kodera, Y. Naka, S. Kobayashi, S. Maeda, K. Kobayashi, H. Aoyama (Toshiba)